Antimony aperture properties on super-resolution near-field structure using different protection layers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4089-4093

  Tominaga, Junji ^a   Fuji, Hiroshi ^b   Sato, Akira ^c   Nakano, Takashi ^a   Fukaya, Toshio ^d   Atoda, Nobufumi ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b SHARP CORPORATION   (Japan)

^c Konica Corporation   (Japan)

^d NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

Antimony thin film; High density recording; Near field optics; Optical memory

Indexed keywords

ANTIMONY; CRYSTAL GROWTH; DIELECTRIC MATERIALS; DIFFRACTION; NONLINEAR OPTICS; OPTICAL PROPERTIES; OPTICAL RECORDING; SILICA; SILICON NITRIDE; TENSILE STRESS; THIN FILMS; ZINC SULFIDE;

DIGITAL VERSATILE DISC; HIGH DENSITY RECORDING; NEAR FIELD OPTICS;

OPTICAL DATA STORAGE;

EID: 0033344042     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4089     Document Type: Article

References (4)

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