Microstructure and roughness improvement of polycrystalline Bi thin films upon pulsed-laser melting

Applied Physics A: Materials Science and Processing

Volumn 62, Issue 6, 1996, Pages 513-518

  Missana, T ^a   Afonso, C N ^a  

^a INSTITUTO DE ÓPTICA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; FILM GROWTH; IRRADIATION; MELTING; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

NANOSECOND PULSE IRRADIATION; POLYCRYSTALLINE FILMS; PULSED LASER MELTING; REAL TIME REFLECTIVITY;

BISMUTH;

EID: 0030169795     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01571685     Document Type: Article

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