Drive current enhancement in sub-50 nm CMOS by reduction of SDE resistance with laser thermal process

Journal of the Electrochemical Society

Volumn 151, Issue 12, 2004, Pages

  Yamamoto, Tomonari ^a   Goto, Ken Ichi ^a   Kubo, Tomohiro ^a   Wang, Yun ^b   Lin, Tim ^b   Talwar, Somit ^b   Kase, Masataka ^a   Sugii, Toshihiro ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

^b Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC RESISTANCE; FIELD EFFECT TRANSISTORS; ION IMPLANTATION; LASER APPLICATIONS; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

AMORPHOUS LAYERS; DRIVE CURRENT ENHANCEMENT; JUNCTION PROFILES; LASER THERMAL PROCESS;

CMOS INTEGRATED CIRCUITS;

EID: 10844294307     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1814454     Document Type: Article

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