메뉴 건너뛰기




Volumn , Issue , 2004, Pages 211-214

Design and InP HEMT technology for ultra-high speed digital ics with beyond 80-Gbit/s operation

Author keywords

80 Gbit s; High speed digital circuit; InP HEMT

Indexed keywords

80 GBIT/S; INP HEMT; METAL-INSULATOR-METAL (MIM) CAPACITORS; TRANSISTOR VARIATION;

EID: 10444278520     PISSN: 15508781     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CSICS.2004.1392540     Document Type: Conference Paper
Times cited : (3)

References (11)
  • 1
    • 2442672988 scopus 로고    scopus 로고
    • A 108Gb/s 4:1 multiplexer in 0.13 μm SiGe-bipolar technology
    • M. Meghelli, "A 108Gb/s 4:1 Multiplexer in 0.13 μm SiGe-Bipolar Technology," IEEE ISSCC 2004 Digest paper, pp. 236-237.
    • IEEE ISSCC 2004 Digest Paper , pp. 236-237
    • Meghelli, M.1
  • 4
    • 0036803456 scopus 로고    scopus 로고
    • Pseudomorphic In0.52Al0.48As/In0.7Ga0.3As HEMTs with an ultrahigh fT of 562 GHz
    • Y. Yamashita et al., "Pseudomorphic In0.52Al0.48As/In0.7Ga0.3As HEMTs with an Ultrahigh fT of 562 GHz," IEEE Electron Device Letters, Vol. 23, No. 10, pp. 573-575, 2002.
    • (2002) IEEE Electron Device Letters , vol.23 , Issue.10 , pp. 573-575
    • Yamashita, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.