Investigation of thermal stability and electrical properties of Al 2O 3-HfO 2 laminate on Si by XPS

Journal of the Korean Physical Society

Volumn 45, Issue 5 II, 2004, Pages 1292-1295

  Jin, Hua ^a   Kang, H J ^a   Lee, S W ^a   Lee, Y S ^b   Rha, S K ^b   Lee, H S ^c   Lim, K Y ^d  

^a Chungbuk National University   (South Korea)

^b Hanbat National University   (South Korea)

^c Korea Testing Laboratory   (South Korea)

^d Hynix Semiconductor Inc   (South Korea)

Author keywords

Electrical properies; HfO 2; High k; XPS, thermal stability

Indexed keywords

EID: 10444273191     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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