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Volumn 13, Issue 6, 2004, Pages 1424-1429

Bulk-micromachined structures inside anisotropically etched cavities

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CANTILEVER BEAMS; COMPOSITE MICROMECHANICS; ELECTRODEPOSITION; MICROMACHINING; MICROSTRUCTURE; PHOTORESISTS; SILICA;

EID: 10444229612     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/13/6/013     Document Type: Article
Times cited : (27)

References (20)
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    • Fabrication of novel three-dimensional microstructures by the anisotropic etching of (100) and (110) silicon
    • Bassous E 1978 Fabrication of novel three-dimensional microstructures by the anisotropic etching of (100) and (110) silicon IEEE Trans. Electron Dev. 25 1178-85
    • (1978) IEEE Trans. Electron Dev. , vol.25 , pp. 1178-1185
    • Bassous, E.1
  • 5
    • 0029212435 scopus 로고
    • A new micromachined silicon high accuracy pressure sensor
    • Mandle J, Lefort O and Migeon A 1995 A new micromachined silicon high accuracy pressure sensor Sensors Actuators A 46/47 129-32
    • (1995) Sensors Actuators A , vol.46-47 , pp. 129-132
    • Mandle, J.1    Lefort, O.2    Migeon, A.3
  • 6
    • 78649270340 scopus 로고    scopus 로고
    • Design and fabrication of microaccelerometers using piezoelectric thin films
    • Yu J-C and Lai F-H 2000 Design and fabrication of microaccelerometers using piezoelectric thin films Ferroelectrics 263 100-6
    • (2000) Ferroelectrics , vol.263 , pp. 100-106
    • Yu, J.-C.1    Lai, F.-H.2
  • 9
    • 0030678723 scopus 로고    scopus 로고
    • Development of micromachined switches with increased reliability
    • Piscataway, NJ: IEEE
    • Hiltmann K, Schmidt B, Sandamair H and Lang W 1997 Development of micromachined switches with increased reliability IEEE Int. Conf. on Transducers vol 2 (Piscataway, NJ: IEEE) pp 1157-60
    • (1997) IEEE Int. Conf. on Transducers , vol.2 , pp. 1157-1160
    • Hiltmann, K.1    Schmidt, B.2    Sandamair, H.3    Lang, W.4
  • 12
    • 10444229263 scopus 로고    scopus 로고
    • 2 micromechanical structures inside anisotropically etched cavity
    • 2 micromechanical structures inside anisotropically etched cavity Int. J. Comput. Eng. Sci. 4 489-92
    • (2003) Int. J. Comput. Eng. Sci. , vol.4 , pp. 489-492
    • Pal, P.1    Tuli, S.2    Chandra, S.3
  • 13
    • 10444252236 scopus 로고    scopus 로고
    • Design and development of microstructures for MEMS applications
    • Chandra S, Singh J and Chand A 1997 Design and development of microstructures for MEMS applications SPIE Proc. 3226 22-30
    • (1997) SPIE Proc. , vol.3226 , pp. 22-30
    • Chandra, S.1    Singh, J.2    Chand, A.3
  • 14
    • 0041978264 scopus 로고    scopus 로고
    • Photolithography challenges for micromachining industry
    • Craven D 1996 Photolithography challenges for micromachining industry BACUS Symp. pp 1-10 (online at www.ultratech.com/pdf/bacus96.pdf)
    • (1996) BACUS Symp. , pp. 1-10
    • Craven, D.1
  • 16
    • 0029390658 scopus 로고
    • Photolithography on micromachined 3D surfaces using electrodeposited photoresist
    • Kersten P, Bouwstra S and Petersen J W 1995 Photolithography on micromachined 3D surfaces using electrodeposited photoresist Sensors Actuators A 51 51-4
    • (1995) Sensors Actuators A , vol.51 , pp. 51-54
    • Kersten, P.1    Bouwstra, S.2    Petersen, J.W.3
  • 17
    • 0041940609 scopus 로고    scopus 로고
    • Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon
    • Heschel M and Bouwstra S 1998 Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon Sensors Actuators A 70 75-80
    • (1998) Sensors Actuators A , vol.70 , pp. 75-80
    • Heschel, M.1    Bouwstra, S.2
  • 18
    • 10444237707 scopus 로고    scopus 로고
    • Spray coating for MEMS, interconnects, and advanced packaging applications
    • Luxbacher T and Mirza A 1999 Spray coating for MEMS, interconnects, and advanced packaging applications Sensors 1661-4
    • (1999) Sensors , pp. 1661-1664
    • Luxbacher, T.1    Mirza, A.2
  • 19
    • 0029429843 scopus 로고
    • High-aspect-ratio photolithography for MEMS applications
    • Mivajima H and Mehregany M 1995 High-aspect-ratio photolithography for MEMS applications J. Microelectromech. Syst. 4 220-9
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    • Mivajima, H.1    Mehregany, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.