Laser deposition of ZnO films on silicon and sapphire substrates

Quantum Electronics

Volumn 33, Issue 11, 2003, Pages 975-980

  Zherikhin, A N ^a   Khudobenko, A I ^a   Williams, R T ^b   Wilkinson, J ^b   User, K B ^b   Xiong, Gang ^b   Voronov, V V ^c  

^a INSTITUTE ON LASER AND INFORMATION TECHNOLOGIES   (Russian Federation)

^b WAKE FOREST UNIVERSITY   (United States)

^c PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

Author keywords

Induced emission; Laser deposition; Sapphire substrate; Zinc oxide

Indexed keywords

INDUCED EMISSION; LASER DEPOSITION; ZINC OXIDE FILM;

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; LASER ABLATION; MORPHOLOGY; OPTICAL FILMS; PHOTOLUMINESCENCE; SAPPHIRE; SILICON; SUBSTRATES;

ZINC OXIDE;

EID: 1042277669     PISSN: 10637818     EISSN: None     Source Type: Journal    
DOI: 10.1070/QE2003v033n11ABEH002533     Document Type: Article

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