In situ X-ray analysis of solid/electrolyte interfaces: Electrodeposition of Cu and Co on Si(111):H and GaAs(001) and corrosion of Cu3Au(111)

Surface Science

Volumn 573, Issue 1, 2004, Pages 67-79

  Zegenhagen, J ^a   Renner, F U ^a   Reitzle, A ^b   Lee, T L ^a   Warren, S ^a   Stierle, A ^c   Dosch, H ^c   Scherb, G ^d   Fimland, B O ^e   Kolb, D M ^b  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b UNIVERSITY OF ULM   (Germany)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^d MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^e NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

Author keywords

Clusters; Cobalt; Copper; Electrochemical methods; Epitaxy; Gold; Silicon; Single crystal surfaces; Solid liquid interfaces; X ray scattering, diffraction, and reflection; X ray standing waves

Indexed keywords

COPPER COMPOUNDS; CORROSION; ELECTROCHEMICAL CORROSION; ELECTROCHEMISTRY; ELECTRODEPOSITION; EPITAXIAL GROWTH; INTERFACES (MATERIALS); LATTICE CONSTANTS; SEMICONDUCTING GALLIUM ARSENIDE; SINGLE CRYSTALS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY SCATTERING;

CLUSTERS; ELECTROCHEMICAL METHODS; SINGLE CRYSTAL SURFACES; SOLID-LIQUID INTERFACES; X-RAY STANDING WAVES;

SOLID ELECTROLYTES;

EID: 10044277250     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.145     Document Type: Conference Paper

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