In situ XPS and SIMS analysis of O 2 + beam-induced silicon oxidation

Surface and Interface Analysis

Volumn 36, Issue 7, 2004, Pages 640-644

  Tan, S K ^a   Yeo, K L ^a   Wee, A T S ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Ion beam oxidation; Secondary ion mass spectrometry; Surface transient; X ray photoelectron spectroscopy

Indexed keywords

ION BEAM BOMBARDMENT; ION BEAM OXIDATION; SILICON OXIDATION; SURFACE TRANSIENTS;

COMPOSITION; ION BEAMS; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; SURFACE TREATMENT; TRANSIENTS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 3242696729     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1903     Document Type: Article

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