SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 131-134

Growth of chromium carbide capped-carbon nanotip using bias-assisted microwave plasma chemical vapor deposition

(3) Hsu, C H a Shi, S C a Chen, C F a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Bias; Carbon nanotip; Chromium carbide; Microwave plasma chemical vapor deposition

Indexed keywords

CARBON NANOTUBES; CARBURIZING; CATALYSTS; ION BOMBARDMENT; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CHROMIUM CARBIDE; CHROMIUM NANOTIPS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; SURFACE DIFFUSION;

CHROMIUM COMPOUNDS;

EID: 10044273018 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.08.072 Document Type: Article

Times cited : (2)

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