Novel mask-wafer gap measurement scheme with nanometer-level detectivity

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2698-2702

  Moon, Euclid E ^a   Everett, Patrick N ^b   Meinhold, Mitchell W ^c   Mondol, Mark K ^c   Smith, Henry I ^c  

^a USA   (United States)

^b Patrick N Everett Consulting   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033265532     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591048     Document Type: Article

References (5)

1. S. Hector et al., J. Vac. Sci. Technol. B 15, 2517 (1997).
2. E. E. Moon, J. Lee, P. N. Everett, and H. I. Smith, J. Vac. Sci. Technol. B 16, 3631 (1998).
3. M. Nelson, J. L. Kreuzer, and G. Gallatin, J. Vac. Sci. Technol. B 12, 3251 (1994).
4. D. C. Flanders and T. M. Lyszcarz, J. Vac. Sci. Technol. B 1, 1196 (1983).
5. E. E. Moon, P. N. Everett, K. Rhee, and H. I. Smith, J. Vac. Sci. Technol. B 14, 3969 (1996).