Alternating Phase Shift Mask Architecture Scalability, Implementations and Applications for 90nm & 65 nm technology nodes and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 766-777

  Cheng, Wen Hao ^a   Chakravorty, Kishore ^a   Farnsworth, Jeff ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Alternating phase shift mask; Architecture; Phase edge; Resolution enhancement technique; Scalability

Indexed keywords

ALTERNATING PHASE SHIFT MASKS; PHASE EDGES; RESOLUTION ENHANCEMENT TECHNIQUES;

ERRORS; ETCHING; INTEGRATED CIRCUIT LAYOUT; LITHOGRAPHY; LOGIC DEVICES; OPTICAL RESOLVING POWER; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

MASKS;

EID: 0942290246     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504391     Document Type: Conference Paper

References (26)

1. L. Liebmann, "Resolution Enhancement Techniques in Optical Lithography, It's not just a Mask Problem", SPIE Vol. 4409, 23, 2001.
2. A. Wong, "Resolution Enhancement Techniques in Optical Lithography", SPIE Press, 2001.
3. Y. Borodovsky, et al, "Lithography Strategy for 65nm Node", SPIE Vol. 4754, 2002.
4. C. Pierrat et al, "Phase-shifting Mask Topography Effects on Lithographic Image Quality", SPIE Vol. 1927, 28, 1993.
5. M.D. Levenson et al, "Phase Phirst! An Improved Strong-PSM Paradigm", SPIE, 4186-42, 2000.
6. Y. Morikawa et al, "100nm AltPSM structure discussion for ArF Litho.", SPIE, Vol. 4409, 2001.
7. K.K. Toh et al, "Optical lithography with chrome-less phase-shifted masks", SPIE, Vol. 1463, 74, 1991.
8. J. F. Chen et al, "Chrome-less phase lithography", Solid State Technology, June, 67, 2002.
9. M.D. Levenson et al, "The Vortex Mask: Making 80nm contacts with a twist", SPIE, 4889-148, 2002.
10. M. Fritz at al, "100nm Node Lithography with KrF", SPIE Vol. 4346, 191, 2001.
11. J.S. Petersen, D.J. Gerold, M.D. Levenson, "Multiple Pitch Transmission and Phase Analysis of Six Types of Strong Phase-Shifting Masks", SPIE, 4346-72, 2001.
12. International Technology Roadmap for Semiconductors, 2002 Update.
13. J. F. Chen et al, "Binary Halftone Chrome-less PSM Technology for λ/4 Optical Lithography", SPIE Vol. 4346-51, 2001.
14. J.A. Torres et al, "Alternatives to Alt. Phase Shift Masks for 65nm", SPIE, Vol. 4889, 540, 2002.
15. S.-H. Kim et al, "Application of Chrome-less mask technology for sub-100nm gate with single exposure", SPIE BACUS, Vol. 4889, 568, 2002.
16. Y. Sato et al, "Process bias control with thin chrome film blanks for 90nm reticle fabrication", SPIE, Vol. 4889, 50, 2002.
17. Q. Wu et al, "Scaling rules for Phase Error Control for the Manufacturing of Alternating Phase Shift Masks for 193nm Photolithography and Beyond", SPIE, 5040-29, 2003.
18. R.E. Schenker et al, "Alt-PSM for low k1 contact patterning", SPIE, 5040-28, 2003.
19. K. Appel and W. Haken, Every planar map is four colorable. Part I. Discharging, Illinois J. Math. 21 (1977), 429-490. K. Appel, W. Haken and J. Koch, Every planar map is four colorable. Part II. Reducibility, Illinois J. Math. 21 (1977), 491-567.
20. K. Appel and W. Haken, Every planar map is four colorable. Part I. Discharging, Illinois J. Math. 21 (1977), 429-490. K. Appel, W. Haken and J. Koch, Every planar map is four colorable. Part II. Reducibility, Illinois J. Math. 21 (1977), 491-567.
21. A.B. Kahng, "VLSI physical design algorithms for phase shifting technology", Final report 1999-2000 for MICRO project, UCSD, 2000.
22. L.W. Liebmann et al, "Layout optimization at the pinnacle of optical litho.", SPIE, 5042-1, 2003.
23. C. Pierrat et al, "New Alternating Phase-Shifting mask conversion methodology using phase conflict resolution", SPIE, Vol. 4691, 325, 2002.
24. J. Nistler et al, "Issues associated with commercialization of phase-shifting masks", SPIE, Vol. 1604, 236, 1991.
25. R. Wang et al, "Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design", SPIE, Vol. 4562, 2002.
26. C. Pierrat, "MEF revisited: low k1 effect versus mask topography effects", SPIE, 5040-19, 2003.