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Volumn 4409, Issue , 2001, Pages 23-32

Resolution enhancement techniques in optical lithography, it's not just a mask problem

Author keywords

Alternating phase shifted mask; Resolution enhancement technologies; Sub resolution assist features

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC FIELD EFFECTS; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; LIGHT TRANSMISSION; LOGIC CIRCUITS; MASKS;

EID: 0035188064     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438332     Document Type: Conference Paper
Times cited : (37)

References (13)
  • 2
    • 0026388671 scopus 로고
    • Conjugate twin-shifter for new phase shift method to high resolution lithography
    • (1991) SPIE , vol.1463 , pp. 112
    • Ohtsuka, H.1
  • 12
    • 0000327680 scopus 로고
    • 170nm gates fabricated by phase shift mask and top anti-reflector process
    • (1993) Proc. SPIE , vol.1927 , pp. 16
    • Brunner, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.