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Volumn 4409, Issue , 2001, Pages 23-32
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Resolution enhancement techniques in optical lithography, it's not just a mask problem
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Author keywords
Alternating phase shifted mask; Resolution enhancement technologies; Sub resolution assist features
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRIC FIELD EFFECTS;
INTEGRATED CIRCUIT LAYOUT;
INTEGRATED CIRCUIT MANUFACTURE;
LIGHT TRANSMISSION;
LOGIC CIRCUITS;
MASKS;
ATTENUATED PHASE SHIFTED MASK ENHANCED LITHOGRAPHY;
OPTICAL PROXIMITY CORRECTION;
RESOLUTION ENHANCEMENT TECHNIQUES;
SUBRESOLUTION ASSIST FEATURES;
PHOTOLITHOGRAPHY;
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EID: 0035188064
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.438332 Document Type: Conference Paper |
Times cited : (37)
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References (13)
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