Polarized phase shift mask: Concept, design, and potential advantages to photolithography process and physical design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 406-417

  Wang, Ruoping ^a   Grobman, Warren ^a   Reich, Alfred ^a   Thompson, Matthew ^a  

^a MOTOROLA INC   (United States)

Author keywords

Phase conflict; Phase shift mask; Physical design; Polarized light

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; LIGHT POLARIZATION; LIGHT TRANSMISSION; PHASE SHIFT; PHOTOLITHOGRAPHY;

PHASE SHIFT MASKS (PSM);

MASKS;

EID: 0035767722     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458317     Document Type: Article

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