Using OPC to optimize for image slope and improve process window

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 838-846

  Cobb, Nick ^a   Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Matrix; MEEF; OPC; Process window

Indexed keywords

EDGE PLACEMENT ERRORS (EPE); MASK ERROR ENHANCEMENT FACTORS (MEEF); OPTICAL PROXIMITY CORRECTION (OPC); PROCESS WINDOW;

COMPUTER SOFTWARE; EDGE DETECTION; ERROR CORRECTION; FOCUSING; IMAGE ANALYSIS; MASKS; OPTIMIZATION; ROBUSTNESS (CONTROL SYSTEMS);

OPTICAL ENGINEERING;

EID: 0942279325     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504379     Document Type: Conference Paper

References (9)

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