Lithographic comparison of assist feature design strategies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Mansfield, Scott M ^a   Liebmann, Lars W ^a   Molless, Antoinette F ^a   Wong, Alfred K ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; LENSES; MASKS;

ASSIST FEATURES; OPTICAL PROXIMITY CORRECTIONS; SCATTERING BARS;

PHOTOLITHOGRAPHY;

EID: 0033713396     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)