Model-Assisted Placement of Sub-Resolution Assist Features: Experimental Results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 99-106

  Brist, Travis ^a   Torres, J A ^b  

^a AGERE SYSTEMS   (United States)

^b MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Low k1 imaging; Micro lithography; Model Based Assist Features; OPC; Scattering Bars

Indexed keywords

COMPUTER SIMULATION; FEATURE EXTRACTION; IMAGING TECHNIQUES; LIGHTING; ROBUSTNESS (CONTROL SYSTEMS);

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0242441452     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485421     Document Type: Conference Paper

References (2)

1. J.A. Torres, Y Granik, L Capodieci, "Contrast Based Assist Feature Optimization", in Optical Microlithography XV, Proc. SPIE Vol. 4691 (2002), 179-187
2. T Brist, G Bailey,"Reticle Process Effects on OPC Models", in Optical Microlithography XV, Proc. SPIE Vol. 4691 (2002), 1373-1382