Reactive Phase Formation in Thin Film Metal/Metal and Metal/Silicon Diffusion Couples

Critical Reviews in Solid State and Materials Sciences

Volumn 28, Issue 3, 2003, Pages 185-230

  Laurila, Tomi ^a   Molarius, Jyrki ^b  

^a AALTO UNIVERSITY   (Finland)

^b VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

Diffusion kinetics; Phase diagrams; Phase formation; Thermodynamics

Indexed keywords

ACTIVATION ENERGY; ELASTICITY; GIBBS FREE ENERGY; GRAIN BOUNDARIES; IMPURITIES; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); NUCLEATION; PHASE DIAGRAMS; SILICON; STRAIN; STRESSES; THERMODYNAMICS;

DIFFUSION KINETICS; PHASE FORMATION;

THIN FILMS;

EID: 0942277956     PISSN: 10408436     EISSN: None     Source Type: Journal    
DOI: 10.1080/10408430390261955     Document Type: Article

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