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Volumn 80, Issue 6, 2002, Pages 938-940

Amorphous layer formation at the TaC/Cu interface in the Si/TaC/Cu metallization system

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; AS-DEPOSITED FILMS; METALLIZATION SYSTEMS; THERMODYNAMIC EVALUATION;

EID: 79956043837     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1447601     Document Type: Article
Times cited : (27)

References (14)
  • 10
    • 0016070909 scopus 로고
    • 8q5 MTGTBF 0026-086X
    • S. Stecura, Metall. Trans. 5, 1337 (1974). 8q5 MTGTBF 0026-086X
    • (1974) Metall. Trans. , vol.5 , pp. 1337
    • Stecura, S.1
  • 13
    • 0942289180 scopus 로고
    • edited by H. Jain and D. Gupta (TMS, Warrendale, PA)
    • M.-A. Nicolet, in Diffusion in Amorphous Materials, edited by H. Jain and D. Gupta (TMS, Warrendale, PA, 1994), pp. 225-234.
    • (1994) Diffusion in Amorphous Materials , pp. 225-234
    • Nicolet, M.-A.1
  • 14
    • 0942289185 scopus 로고
    • ado AMETAR 0001-6160
    • J. Burke, Acta Metall. 10, 501 (1962). ado AMETAR 0001-6160
    • (1962) Acta Metall. , vol.10 , pp. 501
    • Burke, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.