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Volumn 80, Issue 6, 2002, Pages 938-940
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Amorphous layer formation at the TaC/Cu interface in the Si/TaC/Cu metallization system
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS LAYER;
AS-DEPOSITED FILMS;
METALLIZATION SYSTEMS;
THERMODYNAMIC EVALUATION;
METALLIZING;
TANTALUM;
TANTALUM OXIDES;
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EID: 79956043837
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1447601 Document Type: Article |
Times cited : (27)
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References (14)
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