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Journal of Materials Research

Volumn 16, Issue 10, 2001, Pages 2939-2946

Effect of oxygen on the reactions in the Si/Ta/Cu metallization system

(5) Laurila, Tomi a Zeng, Kejun a Kivilahti, Jorma K a Molarius, Jyriki b Suni, Ilkka b

a AALTO UNIVERSITY (Finland)

b VTT TECHNICAL RESEARCH CENTRE OF FINLAND (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; GRAIN BOUNDARIES; INTERFACES (MATERIALS); METALLIZING; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MOLECULAR ION SIGNALS;

BINARY MIXTURES;

EID: 0035494708 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2001.0404 Document Type: Article

Times cited : (28)

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