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Volumn , Issue , 2003, Pages 215-218

Poly-Si TFT Fabricated at 150°C Using ICP-CVD and Excimer Laser Annealing for Plastic Substrates

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARRIER MOBILITY; CRYSTAL STRUCTURE; EXCIMER LASERS; HYDROGEN; INDUCTIVELY COUPLED PLASMA; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILICA; SURFACE REACTIONS;

EID: 0842288276     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (21)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.