Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 1, 1997, Pages 77-84

  Srinivasan, Easwar ^a   Lloyd, Daniel A ^a   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031538671     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580480     Document Type: Article

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