Deep X-ray mask with integrated electro-thermal micro xy-stage for 3D fabrication

Sensors and Actuators, A: Physical

Volumn 111, Issue 1, 2004, Pages 37-43

  Lee, Kwang Cheol ^a   Lee, Seung S ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Deep X ray lithography; Electro thermal xy stage; Integrated microactuator; LIGA; X ray mask

Indexed keywords

ANISOTROPY; BEAMS AND GIRDERS; CRYSTAL MICROSTRUCTURE; CURRENT DENSITY; ELECTROPLATING; MICROACTUATORS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SINGLE CRYSTALS; SURFACE ROUGHNESS; SUSPENSIONS (COMPONENTS); THERMOOXIDATION; X RAY LITHOGRAPHY; X RAYS;

DEEP X-RAY LITHOGRAPHY; ELECTRO-THERMAL XY-STAGE; INTEGRATED MICROACTUATORS; LIGA; X-RAY MASKS;

MASKS;

EID: 0442327435     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.10.008     Document Type: Conference Paper

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