Dry etching damage in Pt/Pb(Zr, Ti)O3/Pt capacitors patterned by a single photolithography process step

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 221-224

  Kumihashi, Takao ^a   Kawakami, Hiroshi ^a   Torii, Kazuyoshi ^a   Suga, Mitsuo ^a   Kure, Tokuo ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; CAPACITORS; CRYSTALLIZATION; ELECTRIC SPACE CHARGE; HYSTERESIS; LEAKAGE CURRENTS; PHOTOLITHOGRAPHY; PLATINUM; SEMICONDUCTING LEAD COMPOUNDS;

DRY ETCHING DAMAGE; LEAD ZIRCONATE TITANATE (PZT);

DRY ETCHING;

EID: 0030711978     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)