Aqueous silane-surfactant co-dispersions for deposition of hydrophobic coatings onto pre-oxidized polysilicon

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 232, Issue 1, 2004, Pages 67-75

  Almanza Workman, A Marcia ^a   Raghavan, Srini ^a   Deymier, Pierre ^a   Monk, David J ^b   Roop, Ray ^b  

^a University of Arizona   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Cationic surfactants; Dispersion stability; Hydrophobic coatings; Stiction; Water dispersible organosilanes

Indexed keywords

ADSORPTION; COATING TECHNIQUES; DEPOSITION; POLYSILICON; POSITIVE IONS; STABILITY; SURFACE ACTIVE AGENTS;

MICROELECTROMECHANICAL SYSTEMS;

SILANES;

CATIONIC SURFACTANT; SILANE; SILICONE; TRIMETHYLAMMONIUM SALT DERIVATIVE; WATER;

AQUEOUS SOLUTION; ARTICLE; DISPERSION; GELATION; HYDROPHOBICITY; PRIORITY JOURNAL;

EID: 0348228136     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2003.09.028     Document Type: Article

References (46)

1. Maboudian R., Ashurst W.R., Carraro C. Sens. Actuators A Phys. 82:2000;219-223.
2. Srinivasan U., Houston M.R., Howe R.T., Maboudian R. J. Microelectromech. Syst. 7:1998;252-260.
3. Maboudian R. MRS Bull. 23(6):1998;47-51.
4. Goldmann M., Davidovits J.V., Silberzan P. Thin Solid Films. 327-329:1998;166-171.
5. Angst D.L., Simmons G.W. Langmuir. 7:1991;2236-2242.
6. Silberzan P., Leger L., Ausserre D., Benattar J.J. Langmuir. 7:1991;1647-1651.
7. Parikh A.N., Allara D.L., Azouz I.B., Rondelez F. J. Phys. Chem. 98:1994;7577-7590.
8. Rye R.R. Langmuir. 13:1997;2588-2590.
9. Brzoska J.B., Shahidzadeh N., Rondelez F. Nature. 360:1992;719-721.
10. Pope E.J.A., Mackenzie J.D. J. Non Cryst. Solids. 87:1986;185-198.
11. Legrange J.D., Markham J.L., Kurkjian C.R. Langmuir. 9:1993;1749-1753.
12. Carraro C., Yauw O.W., Sung M.M., Maboudian R. J. Phys. Chem. B. 102:1998;4441-4445.
13. Britt D.W., Hlady V. J. Colloid Interface Sci. 178:1996;775-784.
14. Brandriss S., Margel S. Langmuir. 9:1993;1232-1240.
15. Bunker B.C., Carpick R.W., Assink R.A., Thomas M.L., Hankins M.G., Voigt J.A., Sipola D., de Boer M.P., Gulley G.L. Langmuir. 16:2000;7742-7751.
16. Fadeev A.Y., McCarthy T.J. Langmuir. 16:2000;7268-7274.
17. Almanza-Workman A.M., Raghavan S., Petrovic S., Gogoi B., Deymier P., Monk D.J., Roop R. Thin Solid Films. 423:2003;77-87.
18. Almanza-Workman A.M., Raghavan S., Deymier P., Monk D.J., Roop R. J. Electrochem. Soc. 149:2002;H6-H11.
19. Almanza-Workman A.M., Raghavan S., Deymier P., Monk D.J., Roop R. Sol. State Phenom. 76-77:2001;23-26.
20. Ge S., Takahara A., Kajiyama T. J. Vac. Sci. Technol. A Vac. Surf. Films. 12:1994;2530-2536.
21. F.V. Allan, P.Y. Hsieh, US Patent 3,728,008 (1973) 4 pp.
22. Davey T.W., Ducker W.A., Hayman A.R., Simpson J. Langmuir. 14:1998;3210-3213.
23. Klevens H.B. J. Phys. Chem. 52:1948;130-148.
24. Moulik S.P., Haque M.E., Jana P.K., Das A.R. J. Phys. Chem. 100:1996;701-708.
25. Venable R.L., Nauman R.V. J. Phys. Chem. 68:1964;3498-3503.
26. Alargova R.G., Kochijashky I.I., Sierra M.L., Zana R. Langmuir. 14:1998;5412-5418.
27. Blackmore E.S., Tiddy G.J.T. J. Chem. Soc. Faraday Trans. I. 84:1988;1115-1127.
28. Czerniawski M. Roczniki Chemii. 40:1966;1935-1945.
29. Scales P.J., Grieser F., Healy T.W., White L.R., Chan D.Y.C. Langmuir. 8:1992;965-974.
30. Feltham A.M., Spiro M. Chem. Rev. 71:1971;177-193.
31. N.J. Harrick, Internal Reflection Spectroscopy, second ed., Harrick Scientific Corp., New York, 1979.
32. Sperline R.P., Muralidharan S., Freiser H. Langmuir. 3:1987;198-202.
33. Leyden D.E., Murthy R.S.S., Atwater J.B., Blitz J.P. Anal. Chim. Acta. 200:1987;459-468.
34. Tejedor-Tejedor M.I., Paredes L., Anderson M.A. Chem. Mater. 10:1998;3410-3421.
35. Leyden D.E., Atwater J.B. J. Adhes. Sci. Technol. 5:1991;815-829.
36. Pohl E.R., Osterholtz F.D. Polym. Prepr. Am. Chem. Soc., Division Polym. Chem. 24:1983;200-201.
37. Parikh A.N., Schivley M.A., Koo E., Seshadri K., Aurentz D., Mueller K., Allara D.L. J. Am. Chem. Soc. 119:1997;3135-3143.
38. Kurth D.G., Bein T. Langmuir. 11:1995;578-584.
39. Finklea H.O., Robinson L.R., Blackburn A., Richter B., Allara D., Bright T. Langmuir. 2:1986;239-244.
40. Iimura K.I., Kato T. Colloid Surf. A Physicochem. Eng. Asp. 171:2000;249-264.
41. Maoz R., Sagiv J., Degenhardt D., Moehwald H., Quint P. Supramol. Sci. 2:1995;9-24.
42. Wasserman S.R., Tao Y.T., Whitesides G.M. Langmuir. 5:1989;1074-1087.
43. Banga R., Yarwood J., Morgan A.M., Evans B., Kells J. Thin Solid Films. 284-285:1996;261-266.
44. Rudzinski W., Charmas R., Piasecki W., Prelot B., Thomas F., Villieras F., Cases J.M. Langmuir. 15:1999;5977-5983.
45. Duval Y., Mielczarski J.A., Pokrovsky O.S., Mielczarski E., Ehrhardt J.J. J. Phys. Chem. B. 106:2002;2937-2945.
46. Smith R.W. T. Soc. Min. Eng. 254:1973;353-357.