SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 83, Issue 20, 2003, Pages 4175-4177

Roughness at ZrO2/Si interfaces induced by accelerated oxidation due to the metal oxide overlayer

(1) Watanabe, Heiji a

a NEC CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; INTERFACES (MATERIALS); OXYGEN; SEMICONDUCTING SILICON; SILICATES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

CATALYTIC EFFECTS; INTERFACE OXIDATION; METAL OXIDE OVERLAYER; OXIDANT DIFFUSION; POSTOXIDATION ANNEALING;

OXIDATION;

EID: 0348041880 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1629146 Document Type: Article

Times cited : (23)

References (10)

1
- 0035872897
- G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

2
- 0000020022
- M. Copel, M. Gribelyuk, and E. Gusev, Appl. Phys. Lett. 76, 436 (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 436
- Copel, M.¹ Gribelyuk, M.² Gusev, E.³

3
- 0000361018
- B. H. Lee, L. Kang, R. Nieh, W.-J. Qi, and J. C. Lee, Appl. Phys. Lett. 76, 1926 (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1926
- Lee, B.H.¹ Kang, L.² Nieh, R.³ Qi, W.-J.⁴ Lee, J.C.⁵

4
- 84858580641
- K. Torii, Y. Shimamoto, S. Saito, K. Obata, T. Yamauchi, D. Hisamoto, N. Yokoyama, M. Hiratani, and T. Onai, Extended Abstract of International Workshop on Gate Insulator, Tokyo, Japan (2001), p. 230.
- (2001) Extended Abstract of International Workshop on Gate Insulator, Tokyo, Japan , pp. 230
- Torii, K.¹ Shimamoto, Y.² Saito, S.³ Obata, K.⁴ Yamauchi, T.⁵ Hisamoto, D.⁶ Yokoyama, N.⁷ Hiratani, M.⁸ Onai, T.⁹

5
- 0036045975
- S. Pidin, Y. Morisaki, Y. Sugita, T. Aoyama, K. Irino, T. Nakamura, and T. Sugii, Technical Digest of the VLSI Symposium (2002), p. 28.
- (2002) Technical Digest of the VLSI Symposium , pp. 28
- Pidin, S.¹ Morisaki, Y.² Sugita, Y.³ Aoyama, T.⁴ Irino, K.⁵ Nakamura, T.⁶ Sugii, T.⁷

6
- 0035844422
- H. Watanabe, Appl. Phys. Lett. 78, 3803 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3803
- Watanabe, H.¹

7
- 0035848173
- M. Kundu, N. Miyata, and M. Ichikawa, Appl. Phys. Lett. 78, 1517 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1517
- Kundu, M.¹ Miyata, N.² Ichikawa, M.³

8
- 79956030126
- O. Renault, D. Samour, J.-F. Damlencourt, D. Blin, F. Martin, S. Marthon, N. T. Barrett, and P. Besson, Appl. Phys. Lett. 81, 3627 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3627
- Renault, O.¹ Samour, D.² Damlencourt, J.-F.³ Blin, D.⁴ Martin, F.⁵ Marthon, S.⁶ Barrett, N.T.⁷ Besson, P.⁸

9
- 0030564517
- M. Niwa, K. Okada, and R. Sinclair, Appl. Surf. Sci. 100/101, 425 (1996).
- (1996) Appl. Surf. Sci. , vol.100-101 , pp. 425
- Niwa, M.¹ Okada, K.² Sinclair, R.³

10
- 25744467966
- K. Usuda, M. Nagamine, H. Itoh, and A. Toriumi, MRS Fall Meeting, Abstracts, M7.3 (2001).
- (2001) MRS Fall Meeting, Abstracts
- Usuda, K.¹ Nagamine, M.² Itoh, H.³ Toriumi, A.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.