Deposition of nanocrystalline CNx thin films on Co/Ni-covered substrate by nitrogen-atom-beam-assisted pulsed laser ablation

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 320, Issue 4, 2004, Pages 297-301

  Xu, Ning ^a   Li, Li ^a   Lin, Hao ^a   Wu, Jiada ^a   Wu, Aiming ^a   Sun, Jian ^a   Ying, Zhifeng ^a   Wang, Peinan ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

CNx crystallites; Co Ni co catalyzation; Nitrogen atom beam; Pulsed laser ablation

Indexed keywords

ABLATION; ATOM LASERS; ATOMS; COBALT COMPOUNDS; CRYSTALLITES; LASER ABLATION; NANOCRYSTALS; NICKEL COMPOUNDS; NITROGEN; PULSED LASER DEPOSITION; SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AS-DEPOSITED FILMS; CATALYZATION; COBALT AND NICKELS; NANOCRYSTALLINES; NITROGEN ATOM; PULSED LASER ABLATION DEPOSITIONS; SYNTHESIS PROCESS; TRANSMISSION ELECTRON;

PULSED LASERS;

COBALT; NICKEL; NITROGEN; SILICON;

ARTICLE; CATALYSIS; CHEMICAL BOND; CRYSTAL; FILM; LASER; NANOPARTICLE; RAMAN SPECTROMETRY; SURFACE PROPERTY; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0346728464     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physleta.2003.11.005     Document Type: Article

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