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Diamond and Related Materials

Volumn 12, Issue 10-11, 2003, Pages 2083-2087

Synthesis of amorphous carbon films by plasma-based ion implantation with simultaneous application of DC and pulse bias

(6) Watanabe, Toshiya a,c Yamamoto, Kazuhiro b Tsuda, Osamu a Tanaka, Akihiro b Koga, Yoshinori b Takai, Osamu c

a JAPAN FINE CERAMICS CENTER (Japan)

b Res Ctr for Adv Carbon Materials (Japan)

c NAGOYA UNIVERSITY (Japan)

Author keywords

Carbon film; Chemical bonding; ECR plasma with a mirror field; Plasma based ion implantation; Tribological property

Indexed keywords

DIAMOND LIKE CARBON FILMS; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; FRICTION; HARDNESS; ION IMPLANTATION; PLASMAS; SYNTHESIS (CHEMICAL); THIN FILMS;

TRIBOLOGICAL PROPERTIES;

CARBON;

EID: 0346119962 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(03)00193-6 Document Type: Article

Times cited : (6)

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