Synthesis of amorphous carbon films by plasma-based ion implantation using ECR plasma with a mirror field

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 317-321

  Watanabe, Toshiya ^a   Yamamoto, Kazuhiro ^a   Tsuda, Osamu ^a   Tanaka, Akihiro ^a   Koga, Yoshinori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Carbon film; Chemical bonding; Electron cyclotron resonance (ECR) plasma with a mirror field; Plasma based ion implantation; Tribological property

Indexed keywords

AMORPHOUS FILMS; DIAMOND FILMS; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; SILICON WAFERS;

PULSE BIASING;

COATING TECHNIQUES;

ION IMPLANTATION;

EID: 0036641556     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00096-8     Document Type: Article

References (24)