Development of plasma based ion implantation system using an electron cyclotron resonance plasma source with a mirror field and synthesis of carbon thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 7, 2001, Pages 4684-4690

  Watanabe, Toshiya ^a,c   Yamamoto, Kazuhiro ^b   Koga, Yoshinori ^b   Tanaka, Akihiro ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Carbon film; Chemical bonding; ECR plasma with a mirror field; Mechanical property; Plasma based ion implantation

Indexed keywords

DIAMOND LIKE CARBON FILMS; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; HYDROGEN BONDS; INFRARED SPECTROSCOPY; PLASMA DENSITY; PLASMA SOURCES; SILICON WAFERS; SURFACE ROUGHNESS; THIN FILMS; TRIBOLOGY;

CARBON FILMS;

ION IMPLANTATION;

EID: 0035388340     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.4684     Document Type: Article

References (24)