Formation of a-C thin films by plasma-based ion implantation

Science and Technology of Advanced Materials

Volumn 2, Issue 3-4, 2001, Pages 539-545

  Watanabe, Toshiya ^a   Yamamoto, Kazuhiro ^b   Koga, Yoshinori ^b   Tanaka, Akihiro ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Carbon film; Chemical bonding; ECR plasma with a mirror field; Mechanical property; Plasma based ion implantation

Indexed keywords

EID: 0000146463     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1468-6996(01)00135-8     Document Type: Article

References (19)

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