High-resolution in situ electron beam patterning using Ti(OC3H7)4 as a negative-type resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 2, 2002, Pages 596-603

  Mitchell, William J ^a   Hu, Evelyn L ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; ELECTRON BEAMS; ELECTRON SCATTERING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SENSITIVITY ANALYSIS; SUBSTRATES; SURFACES; TITANIUM COMPOUNDS;

ELECTRON BEAM PATTERNING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036504843     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1458954     Document Type: Article

References (19)