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Volumn 38, Issue 12 B, 1999, Pages 7052-7058
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Effect of chelating agents on high resolution electron beam nanolithography of spin-coatable A12O3 gel films
a a a a a |
Author keywords
Al2O3 gel films; Chelating agents; Electron beam nanolithography; Nanopatterning
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Indexed keywords
AGENTS;
ALUMINA;
CHELATION;
ELECTRON CYCLOTRON RESONANCE;
ETCHING;
GELS;
KETONES;
NANOTECHNOLOGY;
PLASMA APPLICATIONS;
SEMICONDUCTING FILMS;
ACETYLACETONE;
ALUMINUM BUTOXIDE;
CHELATING AGENTS;
ETHYLACETOACETATE;
HIGH RESOLUTION ELECTRON BEAM NANOLITHOGRAPHY;
ELECTRON BEAM LITHOGRAPHY;
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EID: 0033318389
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.7052 Document Type: Article |
Times cited : (20)
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References (17)
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