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Volumn 38, Issue 12 B, 1999, Pages 7052-7058

Effect of chelating agents on high resolution electron beam nanolithography of spin-coatable A12O3 gel films

Author keywords

Al2O3 gel films; Chelating agents; Electron beam nanolithography; Nanopatterning

Indexed keywords

AGENTS; ALUMINA; CHELATION; ELECTRON CYCLOTRON RESONANCE; ETCHING; GELS; KETONES; NANOTECHNOLOGY; PLASMA APPLICATIONS; SEMICONDUCTING FILMS;

EID: 0033318389     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7052     Document Type: Article
Times cited : (20)

References (17)
  • 6
    • 33645040045 scopus 로고
    • Ph. D. Thesis, University of Cambridge
    • C. J. Morgan: Ph. D. Thesis, University of Cambridge, 1994.
    • (1994)
    • Morgan, C.J.1
  • 13
    • 33645043648 scopus 로고    scopus 로고
    • Ph. D. Thesis, University of Cambridge
    • M. S. M. Saifullah: Ph. D. Thesis, University of Cambridge, 1997.
    • (1997)
    • Saifullah, M.S.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.