High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography

Optics Express

Volumn 10, Issue 14, 2002, Pages 586-590

  Cheong, W C ^a   Yuan, X C ^a   Koudriachov, V ^a   Yu, W X ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; CONTROL SYSTEMS; COPOLYMERIZATION; DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; HYDROLYSIS; OPTICAL DEVICES; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; SILICA; SOL-GELS; TITANIUM DIOXIDE;

HIGH PERFORMANCE MICRO-OPTICAL ELEMENTS; HYBRID ORGANOSILICATE GLASS;

OPTICAL MATERIALS;

EID: 0344541471     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OE.10.000586     Document Type: Article

References (8)

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