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Volumn 44, Issue 9, 2000, Pages 1655-1661

Structural and optical properties of GaN films grown by the direct reaction of Ga and NH3 in a CVD reactor

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SEMICONDUCTING FILMS; THICK FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 0342918648     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(00)00098-8     Document Type: Article
Times cited : (18)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.