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Volumn 44, Issue 9, 2000, Pages 1655-1661
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Structural and optical properties of GaN films grown by the direct reaction of Ga and NH3 in a CVD reactor
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
PHOTOLUMINESCENCE;
SEMICONDUCTING FILMS;
THICK FILMS;
X RAY DIFFRACTION ANALYSIS;
GALLIUM NITRIDE;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0342918648
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/S0038-1101(00)00098-8 Document Type: Article |
Times cited : (18)
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References (27)
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