Effect of hydrogen on Cu formation on Si(111)

Surface Science

Volumn 377-379, Issue , 1997, Pages 923-930

  Yasue, T ^a   Koshikawa, T ^a  

^a OSAKA ELECTRO COMMUNICATION UNIVERSITY   (Japan)

Author keywords

Copper; Diffusion and migration; Growth; Hydrogen; Low index single crystal surfaces; Medium energy ion scattering (MEIS); Silicon

Indexed keywords

ATOMS; AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; DIFFUSION IN SOLIDS; FILM GROWTH; HYDROGEN; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SCATTERING; SILICON; SINGLE CRYSTALS;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FESEM); LOW INDEX SINGLE CRYSTAL SURFACES; MEDIUM ENERGY ION SCATTERING (MEIS);

COPPER;

EID: 0031121710     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)01523-9     Document Type: Article

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