Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1653-1658

  Niska, Raymond H ^a   Constant, Alan P ^b   Witt, Tony ^b   Gregory, Otto J ^c  

^a HONEYWELL   (United States)

^b IOWA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF RHODE ISLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; SENSORS; SPACE APPLICATIONS; STRAIN GAGES; THERMOCOUPLES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

THERMALLY GROWN OXIDE (TGO);

ALUMINA;

EID: 0034226723     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582401     Document Type: Article

References (7)

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7. T. Huang et al., Advances in X-Ray Analysis, edited by C. S. Barren et al. (Plenum, New York, 1990), Vol. 33, p. 295.