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Volumn 4504, Issue , 2001, Pages 106-113

Absolute EUV yield of laser-irradiated Xe-clusters in dependence on the pulse width

Author keywords

EUV lithography; Fs ps ns laser; Gas cluster; Laser produced plasma

Indexed keywords

BANDWIDTH; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LASER PULSES; NEODYMIUM LASERS; ULTRAVIOLET RADIATION; XENON;

EID: 0035764423     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448455     Document Type: Conference Paper
Times cited : (3)

References (32)
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