Absolute EUV yield of laser-irradiated Xe-clusters in dependence on the pulse width

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4504, Issue , 2001, Pages 106-113

  Nickles, P V ^a   Schnurer M ^a   Stiel, H ^a   Vogt, U ^a   Ter Avetisyan, S ^a   Sandner, W ^a  

^a MAX BORN INSTITUT   (Germany)

Author keywords

EUV lithography; Fs ps ns laser; Gas cluster; Laser produced plasma

Indexed keywords

BANDWIDTH; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LASER PULSES; NEODYMIUM LASERS; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0035764423     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448455     Document Type: Conference Paper

References (32)

1. Emerging Lithography Technologies IV, SPIE 3997 (2000).
2. H. Kondo, T. Tomie, H. Shimizu, Appl. Phys. Lett. 72, 2668 (1998).
3. J. Thieme, G. Schmahl, D. Rudolph, E. Umbach (Ed.s) X-ray Microscopy and Spectromicroscopy (Springer, Heidelberg, 1998).
4. T. Ditmire, R.A. Smith, J.W.G. Tisch, M.H.R. Hutchinson, Phys. Rev. Lett. 78, 3121 (1997).
5. T. Ditmire, T. Donnelly, A.M. Rubenchik, R.W. Falcone, M.D. Perry, Phys. Rev. A 53, 3379 (1996).
6. A. McPherson, B.D. Thompson, A.B. Borisov, K. Boyer, C.K. Rhodes, Nature 370, 631 (1994).
7. T. Ditmire, J.W.G. Tisch, E. Springate, M.B. Mason, H. Hay, R.A. Smith, J. Marangos, M.H.R. Hutchinson, Nature 386, 54 (1997).
8. M. Lezius, S. Dobosz, D. Normand, M. Schmidt, Phys. Rev. Lett. 80, 261 (1998).
9. K. Boyer, B.D. Thompson, A. McPherson, C.K. Rhodes, J. Phys. B. At. Mol. Opt. Phys. 27, 4373 (1994).
10. D. Stearns, R. Rosen, S. Vernon, Appl. Opt. 32, 6952 (1993).
11. K. Skulina, C. Alford, R. Bionta, D. Makowieki E. Gullikson, R. Soufli, J. Kortright, J. Underwood, Appl. Opt. 34, 3727 (1995).
12. E. Parra, I. Alexeev, J. Fan, K.Y. Kirn, S.J. McNaught, H.M. Milchberg, Phys. Rev. E 62, R5931 (2000).
13. E. Miura, H. Honda, K. Katsura, E. Takahashi, K. Kondo, Appl. Phys. 70, 783 (2000).
14. D.A. Tichenor, A.K. Ray-Chaudhuri, W.C. Replogle, R.H. Stulen, G.D. Kubiak, L.E. Klebanoff, J.B. Wronosky, L.C. Hale, H.N. Chapman, J.S. Taylor, SPIE 4343, (2001).
15. P.V. Nickles, M. Kalachnikov, P.J. Warwick, K.A. Janulewicz, W. Sandner, U. Jahnke, D. Hilscher, M. Schnürer, R. Nolte, A. Rousse, Quantum Electronics (Russia) 29, 444 (1999).
16. S. Ter-Avetisyan et al. accepted for publication in Phys. Rev. E.
17. T. Auguste, P.D. Oliveira, S. Hulin, P. Monot, J. Abdallah, Jr., A.Ya. Faenov, I.Yu. Skobolev, A.I. Magunov, T.A. Pikuz, JETP Lett. 72, 38 (2000).
18. O.F. Hagena, W. Obert, J. Chem. Phys. 56, 1793 (1972); O.F. Hagena, Rev. Sci. Instr. 63, 2374 (1992).
19. O.F. Hagena, W. Obert, J. Chem. Phys. 56, 1793 (1972); O.F. Hagena, Rev. Sci. Instr. 63, 2374 (1992).
20. T. Wilhein, S. Rehbein, D. Hambach, M. Berglund, L. Rymell, H.M. Hertz, Rev. Sci. Instr. 70, 1694 (1999).
21. The large uncertainty comes from the average density number estimation in the interaction zone and further specifics of this method, see A.J. Bell et al. J. Phys. D: Appl. Phys. 26, 994 (1993).
22. T. Ditmire and R.A. Smith, Opt. Lett. 23, 619 (1998).
23. software IDEA, M. Hipp, P. Reiterer, Technical University Graz, Austria.
24. H. Honda, E. Miura, K. Katsura, E. Takahashi, K. Kondo, Phys. Rev. A 61, 23201 (2000).
25. J. Blackburn, P.K. Carroll, J. Costello, G. O'Sullivan, JOSA 73, 1325 (1983).
26. Y.L. Shao, T. Ditmire, J.W.G. Tisch, E. Springate, J.P. Marangos, M.H.R. Hutchinson, Phys. Rev. Lett. 77, 3343 (1996).
27. N.H. Burnett, P.B. Corkum JOSA B6, 1195 (1989).
28. W. Lotz, Z. Phys. 216, 241 (1968).
29. E.E. Fill, JOSA B 11, 2241 (1994).
30. R. de Bruijn, A. Bartnik, H. Fledderus, H. Fiedorowicz, P. Hegeman, R. Constantinescu, F. Bijkerk, SPIE 3997, 157 (2000).
31. D.A. Tichenor, G.D. Kubiak, W.C. Replogle, L.E. Klebanoff, J.B. Wronosky, L.C. Hale, H.N. Chapman, J.S. Taylor, J.A. Folta, C. Montcalm, R.M. Hudyma, K.A. Goldberg, P. Naulleau, SPIE 3997, 48 (2000).
32. B.A.M. Hansson, M. Berglund, O. Hembers, H.M. Hertz, SPIE 3997, 729 (2000).