Observation of chemical shifts of Si2p level by an x-ray photoelectron spectroscopy system with a laser-plasma x-ray source

Applied Physics Letters

Volumn 72, Issue 21, 1998, Pages 2668-2670

  Kondo, Hiroyuki ^a   Tomie, Toshihisa ^b   Shimizu, Hideaki ^b  

^a NIKON CORPORATION   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21944444839     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121093     Document Type: Article

References (8)

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7. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, in Handbook of X-ray Photoelectron Spectroscopy, edited by J. Chastain (Perkin-Elmer Corp. 1992), p. 57.
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