First-principles study of adhesion at Cu/SiO2 interfaces

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 12, 2003, Pages

  Nagao, Kazutaka ^a,c   Neaton, B ^b   Ashcroft, W ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; HYDROXYL GROUP; OXYGEN; SILICON;

ADHESION; ARTICLE; CHEMICAL BOND; DENSITY; DENSITY FUNCTIONAL THEORY; ENERGY; STRUCTURE ANALYSIS; THEORY;

EID: 0242440105     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.125403     Document Type: Article

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