Nucleation of copper on TiN and SiO2 from the reaction of hexafluoroacetylacetonate copper(I) trimethylvinylsilane

Applied Physics Letters

Volumn 80, Issue 14, 2002, Pages 2604-2606

  Ma, P F ^a   Schroeder, T W ^a   Engstrom, J R ^a  

^a School of Operations Research and Industrial Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRHENIUS DEPENDENCE; CARRIER GAS; CU THIN FILM; EX SITU ANALYSIS; KINETIC MODELS; NUCLEATION PROCESS; NUCLEI DENSITY; ORDERS OF MAGNITUDE; SUBSTRATE TEMPERATURE; THIN FILM MORPHOLOGY;

NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; THIN FILMS; TINNING; TITANIUM NITRIDE;

COPPER;

EID: 79956032898     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1469687     Document Type: Article

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