Simulations of diffusion barrier deposition on porous low-k films

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 363-367

  Yanovitskaya, Z S ^a   Zverev, A V ^a   Shamiryan, D ^b,c   Maex, K ^b,c  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Diffusion barrier; Porous low k film; Simulations

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; MONTE CARLO METHODS; PORE SIZE; POROUS MATERIALS; SUBSTRATES;

DIFFUSION BARRIER;

DIELECTRIC FILMS;

EID: 0142106896     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00378-2     Document Type: Conference Paper

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