Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 80, Issue 4, 2000, Pages 475-486

  aguas H ^a   Silva, V ^a   Ferreira, I ^a   Fortunato, E ^a   Martins, R ^a  

^a Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034175284     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/014186300255122     Document Type: Article

References (10)

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10. SWIFT, J. D., and SCHWAR, M. J. R., 1970, Electrical Probes for Plasma Diagnostics (London: Iliffe).