The French R & D program on EUV lithography: PREUVE

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 700-713

  Paret, Valérie ^a   Boher, Pierre ^a   Robic, Jean Yves ^b   Marmoret, Remy ^c   Schmidt, Martin ^d   Cachoncille, Christophe ^e   Geyl, Roland ^f   Fermé, Jean Jacques ^g   Vidal, Bernard ^h   Barbiche, Jean Marie ⁱ  

^a SOPRA   (France)

^b CEA GRENOBLE   (France)

^c CEA DIF   (France)

^d Centre d Etudes Nucléaires de Saclay   (France)

^e UNIVERSITÉ D'ORLÉANS   (France)

^f SAGEM SA   (France)

^g SESO   (France)

^h AIX MARSEILLE UNIVERSITY   (France)

ⁱ THALES LASER   (France)

Author keywords

EUV; Lithography; Masks; Multilayers; Optics; Reflectometry; Sources

Indexed keywords

LASER PRODUCED PLASMAS; LIGHT EMISSION; MASKS; NANOTECHNOLOGY; OPTICAL MULTILAYERS; OPTICAL VARIABLES MEASUREMENT; OPTICS; RESEARCH AND DEVELOPMENT MANAGEMENT; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER COATING; REFLECTOMETRY;

PHOTOLITHOGRAPHY;

EID: 0141724691     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504564     Document Type: Conference Paper

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