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Volumn 4689 I, Issue , 2002, Pages 286-294

Evaluation of ASML ATHENA alignment system on Intel front-end processes

Author keywords

Alignment; ATHENA; Overlay; Registration

Indexed keywords

ALIGNMENT; MICROELECTRONIC PROCESSING; OPTIMIZATION; SENSITIVITY ANALYSIS;

EID: 0036029658     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473468     Document Type: Article
Times cited : (9)

References (6)
  • 1
    • 0032654738 scopus 로고    scopus 로고
    • Improved wafer stepper alignment performance using an enhanced phase grating alignment system
    • J.H.M. Neijzen, R.D. Morton, P. Dirksen, H.J.L. Megens, F. Bornebroek, "Improved wafer stepper alignment performance using an enhanced phase grating alignment system," Proc. SPIE, Vol. 3677, pp. 382-394, 1999.
    • (1999) Proc. SPIE , vol.3677 , pp. 382-394
    • Neijzen, J.H.M.1    Morton, R.D.2    Dirksen, P.3    Megens, H.J.L.4    Bornebroek, F.5
  • 4
    • 0034763496 scopus 로고    scopus 로고
    • W-CMP alignment using ASML's ATHENA system on an I-line stepper
    • K. Prasad, D. Rajan, T. Kong, G. Sun, S. Morgan, M. Phillips, B. Ng, "W-CMP alignment using ASML's ATHENA system on an I-line stepper," Proc. SPIE, Vol. 4344, pp. 79-88, 2001.
    • (2001) Proc. SPIE , vol.4344 , pp. 79-88
    • Prasad, K.1    Rajan, D.2    Kong, T.3    Sun, G.4    Morgan, S.5    Phillips, M.6    Ng, B.7
  • 6
    • 0030316215 scopus 로고    scopus 로고
    • Overlay improvement through overlay metrology
    • Y. Borodovsky, "Overlay improvement through overlay metrology," Proc. SPIE, Vol. 2726, pp. 311-322, 1996.
    • (1996) Proc. SPIE , vol.2726 , pp. 311-322
    • Borodovsky, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.