Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 382-394

  Neijzen, Jaap H M ^a   Morton, Robert D ^a   Dirksen, Peter ^a   Megens, Henry J L ^a   Bornebroek, Frank ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; DEFORMATION; DIFFRACTION GRATINGS;

ADVANCED PHASE GRATING ALIGNMENT SYSTEM (APGA); CHEMICAL MECHANICAL POLISHING (CMP); PROCESS-INDUCED ALIGNMENT DEVIATIONS (PIAD); SPIN COATING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032654738     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350826     Document Type: Conference Paper

References (15)