SCOPUS 정보 검색 플랫폼

Volumn 5039 II, Issue , 2003, Pages 1272-1280

Challenges of processing thick and ultra-thick photoresist films

Author keywords

IR baking; Positive tone photoresists; SU 8; Thick layer photoresists

Indexed keywords

ASPECT RATIO; INFRARED RADIATION; LOW TEMPERATURE EFFECTS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONIC PROCESSING; PHOTORESISTS; VISCOSITY;

INFRARED BAKING; MICRORESIST TECHNOLOGY; NEGATIVE TONE PHOTORESIST; POSITIVE TONE PHOTORESIST; ULTRA THICK PHOTORESIST FILMS;

THICK FILMS;

EID: 0141610928 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.485084 Document Type: Conference Paper

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.