SCOPUS 정보 검색 플랫폼

Volumn 41-42, Issue , 1998, Pages 433-436

Dependence of the quality of thick resist structures on resist baking

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATIONS; HEAT TREATMENT; INFRARED RADIATION; LITHOGRAPHY;

BAKING; THICK RESIST STRUCTURES;

PHOTORESISTS;

EID: 0031702558 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(98)00100-2 Document Type: Article

Times cited : (9)

References (8)

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2
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3
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- Maciossek, A.¹ Löchel, B.² Quenzer, H.-J.³ Wagner, B.⁴ Schulze, S.⁵ Noetzel, J.⁶

4
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- Loechel, B.¹ Maciossek, M.² Quenzer, H.-J.³ Wagner, B.⁴

5
- 0027660563
- J. Gobet, F. Cardot, J. Bergqvist, F. Rudolf; J. Micromech. Microeng. 3 (1993) 123-130
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6
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7
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- M. Despont, H. Lorenz, N. Fahrni, J. Brugger, P. Renaud, P. Vettiger, Proc. 10th IEEE Workshop on MEMS, Jan. 26-30, 1997, Nagoya
- (1997) Proc. 10th IEEE Workshop on MEMS
- Despont, M.¹ Lorenz, H.² Fahrni, N.³ Brugger, J.⁴ Renaud, P.⁵ Vettiger, P.⁶

8
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- B. Wagner, H.J. Quenzer, W. Henke, W. Hoppe, W. Pilz, Sensors and Actuators A 46-47 (1995) 89-94
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.