Improved resolution of thick film resist (effect of development technique)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 861-882

  Sensu, Yoshihisa ^a   Sekiguchi, Atsushi ^a   Miyake, Yasuhiro ^a  

^a Jpn   (Japan)

Author keywords

Development rate measurement system; Development Technique; Lithography simulations; Mask Aligner; Nitride bubbles; Resolution; Thick film resist

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; RESINS; SILICON; THIN FILMS;

LASER MICROSCOPE ANALYSIS;

PHOTORESISTS;

EID: 0036029160     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474161     Document Type: Conference Paper

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