Influence of resist-baking on the pattern quality of thick photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2879, Issue , 1996, Pages 174-181

  Loechel, Bernd ^a   Rothe, Martina ^a   Fehlberg, Simone ^a   Gruetzner, Gabi ^a   Bleidiessel, Gerhard ^a  

^a Fraunhofer Institute Reliability and Microintegration   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

RESIST BAKING; ULTRAVIOLET LITHOGRAPHY;

ELECTRIC CONNECTORS; ELECTRIC WIRE; ELECTROPLATING; INFRARED RADIATION; MICROELECTROMECHANICAL DEVICES; PHOTOLITHOGRAPHY; QUALITY CONTROL; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 0030411924     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)